Chen Yuyang, Jia Xianshi, Li Zhou, Guo Chuan, Guo Ranfei, Li Kai, Wang Cong, Cui Wenda, Song Changqing, Han Kai, Duan Ji'an
State Key Laboratory of Precision Manufacturing for Extreme Service Performance, College of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China.
School of Intelligent Manufacturing, Hunan First Normal University, Changsha 410221, China.
Nanomaterials (Basel). 2025 Aug 15;15(16):1261. doi: 10.3390/nano15161261.
Alumina ceramic substrates are ideal materials for next-generation microelectronic systems and devices, widely used in aerospace, 5G communications, and LED lighting. High-quality hole processing is essential for system interconnection and device packaging. Millisecond lasers have emerged as a promising choice for hole processing in alumina ceramic due to their high processing efficiency. However, existing research has rarely explored the mechanisms and processing techniques of millisecond laser oblique hole formation. This study systematically investigates the dynamic evolution of oblique hole processing in alumina ceramic through theoretical simulations, online detection, and process experiments. Through the simulation model, we have established the relationship between material temperature and hole depth. By analyzing the ablation phenomena on the upper and lower surfaces of the ceramic during the transient interaction process between the millisecond laser and the ceramic, the material removal mechanism in this process is elucidated. Additionally, this study examines the millisecond laser oblique hole processing technology by analyzing the influence of various laser parameters on hole formation. It reveals that appropriately increasing the single-pulse energy of millisecond lasers can optimize the material removal rate and hole taper. Ultimately, the formation mechanism of millisecond laser oblique hole processing in alumina ceramics is comprehensively summarized. The results provide theoretical and methodological guidance for high-speed laser drilling of alumina ceramic substrates.
氧化铝陶瓷基板是下一代微电子系统和器件的理想材料,广泛应用于航空航天、5G通信和LED照明领域。高质量的打孔加工对于系统互连和器件封装至关重要。由于加工效率高,毫秒激光已成为氧化铝陶瓷打孔加工的一个有前景的选择。然而,现有研究很少探讨毫秒激光斜孔形成的机理和加工技术。本研究通过理论模拟、在线检测和工艺实验,系统地研究了氧化铝陶瓷斜孔加工的动态演变。通过模拟模型,我们建立了材料温度与孔深之间的关系。通过分析毫秒激光与陶瓷瞬态相互作用过程中陶瓷上下表面的烧蚀现象,阐明了该过程中的材料去除机理。此外,本研究通过分析各种激光参数对孔形成的影响,考察了毫秒激光斜孔加工技术。结果表明,适当增加毫秒激光的单脉冲能量可以优化材料去除率和孔锥度。最终,全面总结了氧化铝陶瓷中毫秒激光斜孔加工的形成机理。研究结果为氧化铝陶瓷基板的高速激光钻孔提供了理论和方法指导。