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用于电子产品缺陷检测与分割的Mask R-CNN及深度学习改进

Improvement of mask R-CNN and deep learning for defect detection and segmentation in electronic products.

作者信息

Guo Longjian, Meng Jianming, Hao Wei, Kumar Jain Deepak

机构信息

Department of Electronic and Communication Engineering, Shandong College of Electronic Technology, Jinan, China.

Symbiosis Institute of Technology, Symbiosis International University, Pune, India.

出版信息

PLoS One. 2025 Sep 8;20(9):e0329945. doi: 10.1371/journal.pone.0329945. eCollection 2025.

Abstract

With the rapid development of industrial automation and intelligent manufacturing, defect detection of electronic products has become crucial in the production process. Traditional defect detection methods often face the problems of insufficient accuracy and inefficiency when dealing with complex backgrounds, tiny defects, and multiple defect types. To overcome these problems, this paper proposes Y-MaskNet, a multi-task joint learning framework based on YOLOv5 and Mask R-CNN, which aims to improve the accuracy and efficiency of defect detection and segmentation in electronic products. Y-MaskNet combines the high efficiency of YOLOv5 in target detection with the fine segmentation capability of Mask R-CNN and optimizes the overall performance of the model through a multi-task learning framework. Experimental results show that Y-MaskNet achieves a significant improvement in detection and segmentation tasks, with mAP@[0.5:0.95] reaching 0.72 (up from 0.62 for YOLOv5 and 0.65 for Mask R-CNN) on the PCB Defect Dataset, and IoU improving by 7% compared to existing methods. These improvements are particularly notable in small object detection and fine-grained defect segmentation, making Y-MaskNet an efficient and accurate solution for defect detection in electronic products, offering strong technical support for future industrial intelligent quality control.

摘要

随着工业自动化和智能制造的快速发展,电子产品的缺陷检测在生产过程中变得至关重要。传统的缺陷检测方法在处理复杂背景、微小缺陷和多种缺陷类型时,往往面临准确性不足和效率低下的问题。为了克服这些问题,本文提出了Y-MaskNet,这是一种基于YOLOv5和Mask R-CNN的多任务联合学习框架,旨在提高电子产品缺陷检测和分割的准确性和效率。Y-MaskNet将YOLOv5在目标检测方面的高效性与Mask R-CNN的精细分割能力相结合,并通过多任务学习框架优化模型的整体性能。实验结果表明,Y-MaskNet在检测和分割任务上取得了显著改进,在PCB缺陷数据集上,mAP@[0.5:0.95]达到0.72(YOLOv5为0.62,Mask R-CNN为0.65),与现有方法相比,IoU提高了7%。这些改进在小目标检测和细粒度缺陷分割中尤为显著,使Y-MaskNet成为电子产品缺陷检测的一种高效准确的解决方案,为未来工业智能质量控制提供了有力的技术支持。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e37d/12416829/b2610a384468/pone.0329945.g001.jpg

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