钇基在水溶液中的光化学性质。
Photochemical properties of Yt base in aqueous solution.
作者信息
Paszyc S, Rafalska M
出版信息
Nucleic Acids Res. 1979 Jan;6(1):385-97. doi: 10.1093/nar/6.1.385.
Abstract
Photoreactivity of Yt base [I] has been studied in aqueous solution [pH approximately 6] saturated with oxygen. Two photoproducts (II,III], resulting from irradiation at lambda = 253.7 nm and lambda greater than or equal to 290 nm, were isolated and their structures determined. The quantum yield for Yt base disappearance [zeta dis] is 0.002 [lambda = 313 nm]. It was shown that dye-sensitized photooxidation of Yt base in aqueous solution occurs according to a Type I mechanism, as well as with participation of singlet state oxygen. Quantum yields, fluorescence decay times and phosphorescence of Yt base have been also determined.
摘要
已在饱和氧的水溶液（pH约为6）中研究了钇基[I]的光反应性。分离出了在λ = 253.7 nm和λ≥290 nm照射下产生的两种光产物（II，III），并确定了它们的结构。钇基消失的量子产率[ζdis]为0.002（λ = 313 nm）。结果表明，钇基在水溶液中的染料敏化光氧化反应按照I型机制进行，并且单重态氧也参与其中。还测定了钇基的量子产率、荧光衰减时间和磷光。
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