大肠杆菌中exr和lon基因的相互作用。
Interaction of the exr and lon genes in Escherichia coli.
作者信息
Donch J, Green M H, Greenberg J
出版信息
J Bacteriol. 1968 Nov;96(5):1704-10. doi: 10.1128/jb.96.5.1704-1710.1968.
Abstract
Strains of Escherichia coli carrying the gene lon typically produced excess capsular polysaccharide, and were sensitive to ultraviolet light (UV) irradiation, thymine starvation, and nalidixic acid, forming long filaments after these treatments. Sensitivity was reduced by a number of posttreatments. In the presence of a second UV sensitivity gene, exr, some of these properties were suppressed: long filaments were not formed, the effect of lon on UV and nalidixic acid sensitivity was greatly reduced, and irradiation posttreatments gave an enhancement of survival characteristic of exr rather than lon strains. Production of capsular polysaccharide was not affected by the exr gene.
摘要
携带lon基因的大肠杆菌菌株通常会产生过量的荚膜多糖，并且对紫外线（UV）照射、胸腺嘧啶饥饿和萘啶酸敏感，在这些处理后会形成长丝。多种后处理可降低敏感性。在存在第二个紫外线敏感性基因exr的情况下，其中一些特性受到抑制：不形成长丝，lon对紫外线和萘啶酸敏感性的影响大大降低，并且照射后处理使exr而非lon菌株具有增强的存活特性。荚膜多糖的产生不受exr基因的影响。
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