Kubitschek H E
Science. 1967 Mar 24;155(3769):1545-6. doi: 10.1126/science.155.3769.1545.
Mutants resistant to bacter iophage T5 were produced both in continuous and in stationary cultures of Escherichia coli by near-visible light, 320 to 400 millimicrons, at rates greatly exceeding spontaneous rates in the ab sence of light. Aerobic mutation rates were about twice anaerobic rates, which shows that mutations were induced in either of at least two different proces ses. Mutations induced by near-visible light involve different photochemical processes than those induced by ul traviolet light.
在大肠杆菌的连续培养物和静止培养物中，通过320至400毫微米的近可见光产生了对噬菌体T5具有抗性的突变体，其产生速率大大超过无光条件下的自发速率。需氧突变率约为厌氧突变率的两倍，这表明突变是在至少两个不同过程中的任一过程中诱导产生的。近可见光诱导的突变涉及与紫外线诱导的突变不同的光化学过程。
