Webb R B, Malina M M
Science. 1967 May 26;156(3778):1104-5. doi: 10.1126/science.156.3778.1104.
Mutation to resistance to bacteriophage T5 in continuous cultures of Escherichia coli was induced by visible light (wavelength longer than 408 nanometers) and by black light (300 to 400 nanometers). Mutation rates more than 18 times greater than the spontaneous rate (no light) were obtained with moderate, nonlethal intensities of visible light. Mutation rates for both visible and black light were proportional to irradiance.
在大肠杆菌的连续培养物中,对噬菌体T5的抗性突变是由可见光(波长大于408纳米)和黑光(300至400纳米)诱导产生的。在适度的、非致死强度的可见光下,获得的突变率比自发突变率(无光照)高出18倍以上。可见光和黑光的突变率均与辐照度成正比。