Petrova O N, Manuilova E S, Shapiro N I
Genetika. 1977;13(4):637-45.
Resistance to UV-light was studied in two UV-sensitive aneuploid Chinese hamster cell clones to different origin and degree of sensitivity, their respective polyploids and somatic cell hybrids. The karyotype of the parental clones, cell hybrids and polyploids was analyzed in parallel. A great variability of karyotypes was detected in hybrid cells. Serial cultivation of hybrids was accompanied by chromosome loss. Soon after fusion the hybrid clones proved to be more resistant to UV than the parental sensitive cells. However, their sensitivity increased with passages. The comparison of UV-sensitivity with data on karyotype analysis allowed to assume that the increase in sensitivity was correlated with the loss of particular chromosomes or chromosome regions. The results obtained indicated the existence of a polygenic control of UV-sensitivity, the multiple genes being assigned to different chromosomes. A reverse effect of ploidy was detected, i.e. a decrease in the resistance to the lethal action of UV-light in polyploids as compared to the parental clones.
在两个对紫外线敏感的非整倍体中国仓鼠细胞克隆中研究了对紫外线的抗性,这两个克隆起源不同且敏感程度各异,还研究了它们各自的多倍体和体细胞杂种。同时分析了亲本克隆、细胞杂种和多倍体的核型。在杂种细胞中检测到核型的巨大变异性。杂种细胞的连续培养伴随着染色体丢失。融合后不久,杂种克隆被证明比亲本敏感细胞对紫外线更具抗性。然而,它们的敏感性随着传代而增加。将紫外线敏感性与核型分析数据进行比较后可以推测,敏感性的增加与特定染色体或染色体区域的丢失有关。所获得的结果表明存在对紫外线敏感性的多基因控制,多个基因位于不同的染色体上。检测到倍性的反向效应,即与亲本克隆相比,多倍体对紫外线致死作用的抗性降低。