Deonier R C, Yun K, Kuppermann M
Mol Gen Genet. 1983;190(1):42-50. doi: 10.1007/BF00330322.
Deleted derivatives of F lac+ proC+ tsx+/- purE+ plasmids ORF203 and F13 were isolated and physically characterized. Among 31 deletions, 24 were adjacent to the gamma delta element on F, four were associated with IS2 or IS3 elements normally present on F, and three displayed additional DNA rearrangements. With the genetic selection employed, the deletion endpoints in the chromosomal segment could fall anywhere within a 210 kb (5 min) region between proC and lac. The distribution of endpoints in this region was not random: the endpoints primarily occurred in an extended region near purE, and a 50 kb segment between tsx and purE was devoid of deletion endpoints. Deletion termini for mutants obtained from F13, which contains an additional 48 kb-segment interposed between gamma delta and the target region on ORF203, displayed a distribution similar to that seen for ORF203. Among simple deletions, there was no marked tendency for the chromosomal deletion endpoints to fall at IS1, IS3, or IS5 elements normally present in this chromosomal region. Point mutations and mutations caused by gamma delta or IS transposition into lac appeared in a small proportion of all plasmids studied.
分离出F lac+ proC+ tsx+/- purE+质粒ORF203和F13的缺失衍生物并对其进行物理特性分析。在31个缺失中,24个与F上的γδ元件相邻,4个与F上通常存在的IS2或IS3元件相关,3个显示出额外的DNA重排。采用这种遗传筛选方法,染色体片段中的缺失端点可能落在proC和lac之间210 kb(5分钟)区域内的任何位置。该区域内端点的分布并非随机:端点主要出现在purE附近的一个扩展区域,tsx和purE之间的一个50 kb片段没有缺失端点。从F13获得的突变体的缺失末端,F13在γδ和ORF203上的靶区域之间插入了一个额外的48 kb片段,其分布与ORF203相似。在简单缺失中,染色体缺失端点在该染色体区域中通常存在的IS1、IS3或IS5元件处没有明显的倾向。在所研究的所有质粒中,点突变以及由γδ或IS转座到lac引起的突变只占一小部分。