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HeLa细胞中组胺H1受体介导的肌醇磷酸生成的脱敏作用。

Desensitization of histamine H1 receptor-mediated inositol phosphate production in HeLa cells.

作者信息

Bristow D R, Zamani M R

机构信息

Department of Physiological Sciences, University of Manchester.

出版信息

Br J Pharmacol. 1993 Jun;109(2):353-9. doi: 10.1111/j.1476-5381.1993.tb13577.x.

DOI:10.1111/j.1476-5381.1993.tb13577.x
PMID:8358540
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC2175704/
Abstract
  1. Histamine stimulated the accumulation of total [3H]-inositol phosphates (IPn) in control HeLa cells with an EC50 of 3.7 +/- 0.7 microM in the presence of 10 mM LiCl. The maximum response to histamine after 15 min incubation was 43 +/- 5% over basal accumulation and occurred at a concentration of 1 mM histamine. 2. The histamine-induced IPn production in HeLa cells was confirmed as H1 receptor-mediated, since the H1 antagonist mepyramine (10(-6) M) inhibited the histamine response (10(-4) M) by 83 +/- 7%, whereas the H2 antagonist, ranitidine (10(-4) M), and H3 antagonist, thioperamide (10(-6) M), were ineffective. 3. Histamine (10(-4) M) pretreatment of HeLa cells for 30 min desensitized the subsequent histamine-induced IPn accumulation. The desensitized cells accumulated IPn in response to histamine with an EC50 of 1.7 +/- 0.7 microM after 15 min incubation. The maximum histamine-induced IPn accumulation at 10(-4) M was 19 +/- 5% over basal and was significantly lower (P < 0.03) than the maximum response in control cells. 4. The desensitization of histamine-induced IPn accumulation was time-dependent and, at a desensitizing histamine concentration of 10(-4) M, the half-maximal attenuation occurred after approximately 9 min and maximum desensitization was achieved by 15-20 min. The desensitization of the IPn accumulation was a reversible phenomenon and full recovery of the response occurred 150 min after the removal of the desensitizing histamine-containing medium. The half-time for the recovery of the histamine-induced response was estimated at 120 min. 5. Bradykinin stimulated IPn, accumulation in HeLa cells, and the ECm in control cells of 1.9 +/- 0.2 nM was not significantly different from the EC50 value from histamine-pretreated cells of 1.6 +/- 0.9 nM. The bradykinin response at 1 microM was 194 +/- 48% over basal IPn accumulation in control cells and this value was significantly different (P <0.04) from the 1 microM bradykinin-induced IPn accumulation in histamine pretreated HeLa cells of 143 +/- 38% over basal.6. NaF stimulated IP,, accumulation in control HeLa cells in a dose-related manner, with the maximum effect occurring at 15-20 mM. The EC50 value for NaF-stimulated IPn accumulation in control cells was 10.5 +/- 1.1 mm and the maximum response was 136 +/- 41% over basal after 20 min incubation. In histamine desensitized HeLa cells the EC50 value for NaF was 12.3 +/- 0.4 mM after 20 min stimulation,which was not significantly different from the value obtained in control cells. The maximum NaF stimulated IPn formation in desensitized cells of 68 +/- 23% over basal occurred at 15 -20 mM and was significantly lower (P<0.01) than that obtained in control cells.7. We show here that the acute histamine pretreatment of HeLa cells results in the desensitization of histamine H1 receptor-mediated IPn production. The desensitization was not restricted to the H1 receptor-mediated signal transduction pathway, but also includes both the bradykinin- and NaF mediated responses, supporting a heterologous desensitization mechanism. Our results are consistent with the site of attenuation being at or distal to the G-protein and the underlying mechanism being a slowed time-course for the production of inositol phosphates.
摘要
  1. 在10 mM LiCl存在的情况下,组胺刺激对照HeLa细胞中总[3H] - 肌醇磷酸(IPn)的积累,其EC50为3.7±0.7 microM。孵育15分钟后,对组胺的最大反应比基础积累高43±5%,且在组胺浓度为1 mM时出现。

  2. HeLa细胞中组胺诱导的IPn产生被确认为H1受体介导的,因为H1拮抗剂美吡拉敏(10(-6) M)抑制组胺反应(10(-4) M)达83±7%,而H2拮抗剂雷尼替丁(10(-4) M)和H3拮抗剂硫代哌酰胺(10(-6) M)无效。

  3. 用组胺(10(-4) M)预处理HeLa细胞30分钟,会使随后组胺诱导的IPn积累脱敏。孵育15分钟后,脱敏细胞对组胺积累IPn的EC50为1.7±0.7 microM。在10(-4) M组胺时,最大组胺诱导的IPn积累比基础值高19±5%,且显著低于(P < 0.03)对照细胞中的最大反应。

  4. 组胺诱导的IPn积累脱敏是时间依赖性的,在脱敏组胺浓度为10(-4) M时,大约9分钟后出现半数最大衰减,15 - 20分钟达到最大脱敏。IPn积累的脱敏是一种可逆现象,去除含脱敏组胺的培养基150分钟后反应完全恢复。组胺诱导反应恢复的半衰期估计为120分钟。

  5. 缓激肽刺激HeLa细胞中IPn的积累,对照细胞中的EC50为1.9±0.2 nM,与组胺预处理细胞的EC50值1.6±0.9 nM无显著差异。在对照细胞中,1 microM缓激肽时的反应比基础IPn积累高194±48%,该值与组胺预处理的HeLa细胞中1 microM缓激肽诱导的IPn积累(比基础值高143±38%)有显著差异(P < 0.04)。

  6. NaF以剂量相关方式刺激对照HeLa细胞中IPn的积累,最大效应在15 - 20 mM时出现。对照细胞中NaF刺激IPn积累的EC50值为10.5±1.1 mM,孵育20分钟后最大反应比基础值高136±41%。在组胺脱敏的HeLa细胞中,刺激20分钟后NaF的EC50值为12.3±0.4 mM,与对照细胞中获得的值无显著差异。在15 - 20 mM时,脱敏细胞中NaF刺激的IPn形成比基础值高68±23%,且显著低于(P < 0.01)对照细胞中获得的值。

  7. 我们在此表明,HeLa细胞的急性组胺预处理导致组胺H1受体介导的IPn产生脱敏。这种脱敏不仅限于H1受体介导的信号转导途径,还包括缓激肽和NaF介导的反应,支持一种异源脱敏机制。我们的结果与衰减位点在G蛋白处或其远端以及潜在机制是肌醇磷酸产生的时间进程减慢一致。

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