Xu F, Berka R M, Wahleithner J A, Nelson B A, Shuster J R, Brown S H, Palmer A E, Solomon E I
Novo Nordisk Biotech, 1445 Drew Avenue, Davis, CA 95616, USA.
Biochem J. 1998 Aug 15;334 ( Pt 1)(Pt 1):63-70. doi: 10.1042/bj3340063.
A Myceliophthora thermophila laccase and a Rhizoctonia solani laccase were mutated on a pentapeptide segment believed to be near the type-1 Cu site. The mutation L513F in Myceliophthora laccase and the mutation L470F in Rhizoctonia laccase took place at a position corresponding to the type-1 Cu axial methionine (M517) ligand in Zucchini ascorbate oxidase. The triple mutations V509L,S510E,G511A in Myceliophthora laccase and L466V,E467S,A468G in Rhizoctonia laccase involved a sequence segment whose homologue in ascorbate oxidase is flanked by the M517 and a type-1 Cu-ligating histidine (H512). The single mutation did not yield significant changes in the enzymic properties (including any significant increase in the redox potential of the type-1 Cu). In contrast, the triple mutation resulted in several significant changes. In comparison with the wild type, the Rhizoctonia and Myceliophthora laccase triple mutants had a phenol-oxidase activity whose pH optimum shifted 1 unit lower and higher, respectively. Although the redox potentials were not significantly altered, the Km, kcat and fluoride inhibition of the laccases were greatly changed by the mutations. The observed effects are interpreted as possible mutation-induced structural perturbations on the molecular recognition between the reducing substrate and laccase and on the electron transfer from the substrate to the type-1 Cu centre.
嗜热毁丝霉漆酶和立枯丝核菌漆酶在一个被认为靠近1型铜位点的五肽片段上发生了突变。嗜热毁丝霉漆酶中的L513F突变和立枯丝核菌漆酶中的L470F突变发生在与西葫芦抗坏血酸氧化酶中1型铜轴向甲硫氨酸(M517)配体相对应的位置。嗜热毁丝霉漆酶中的三重突变V509L、S510E、G511A和立枯丝核菌漆酶中的L466V、E467S、A468G涉及一个序列片段,其在抗坏血酸氧化酶中的同源物位于M517和一个1型铜连接组氨酸(H512)之间。单突变并未导致酶性质发生显著变化(包括1型铜的氧化还原电位没有显著增加)。相比之下,三重突变导致了几个显著变化。与野生型相比,立枯丝核菌和嗜热毁丝霉漆酶三重突变体的酚氧化酶活性的最适pH分别向更低和更高的方向移动了1个单位。尽管氧化还原电位没有显著改变,但突变极大地改变了漆酶的Km、kcat和氟化物抑制作用。观察到的效应被解释为可能是突变引起的对还原底物与漆酶之间分子识别以及从底物到1型铜中心的电子转移的结构扰动。