Krieger-Liszkay A, Rutherford A W
Département de Biologie Cellulaire et Moléculaire, CNRS URA 2096, CEA Saclay, Gif-sur-Yvette, France,
Biochemistry. 1998 Dec 15;37(50):17339-44. doi: 10.1021/bi9822628.
Here we show that herbicide binding influences the redox potential (Em) of the plastoquinone QA/QA- redox couple in Photosystem II (PSII). Phenolic herbicides lower the Em by approximately 45 mV, while DCMU raises the Em by 50 mV. These shifts are reflected in changes in the peak temperature of thermoluminescence bands arising from the recombination of charge pairs involving QA-. The herbicide-induced changes in the Em of QA/QA- correlate with earlier work showing that phenolic herbicides increase the sensitivity of PSII to light, while DCMU protects against photodamage. This correlation is explained in terms of the following hypothesis which is based on reactions occurring in the bacterial reaction center. The back-reaction pathway for P680+QA- is assumed to be modulated by the free-energy gap between the P680+QA- and the P680+Ph- radical pairs. When this gap is small (i.e., when the Em of QA/QA- is lowered), a true back-reaction is favored in which P680+Ph- is formed, a state which decays forming a significant yield of P680 triplet. This triplet state of chlorophyll reacts with oxygen, forming singlet oxygen, a species likely to be responsible for photodamage. When the free-energy gap is increased (i.e., when the Em of QA/QA- is raised), the yield of the P680+Ph- is diminished and a greater proportion of the P680+QA- radical pair decays by an alternative, less damaging, route. We propose that at least some of the phytotoxic properties of phenolic herbicides may be explained by the fact that they render PSII ultrasensitive to light due to this mechanism.
在此我们表明,除草剂结合会影响光系统II(PSII)中质体醌QA/QA-氧化还原对的氧化还原电位(Em)。酚类除草剂使Em降低约45 mV,而敌草隆使Em升高50 mV。这些变化反映在由涉及QA-的电荷对复合产生的热释光带的峰值温度变化上。除草剂诱导的QA/QA-的Em变化与早期的研究结果相关,早期研究表明酚类除草剂会增加PSII对光的敏感性,而敌草隆可防止光损伤。这种相关性可以用以下基于细菌反应中心发生的反应的假说来解释。假设P680+QA-的反向反应途径受P680+QA-和P680+Ph-自由基对之间的自由能差调节。当这个差值较小时(即当QA/QA-的Em降低时),有利于形成P680+Ph-的真正反向反应,这种状态会衰变形成大量的P680三重态。叶绿素的这种三重态与氧气反应,形成单线态氧,这种物质可能是造成光损伤的原因。当自由能差增加时(即当QA/QA-的Em升高时),P680+Ph-的产率降低,并且更大比例的P680+QA-自由基对通过另一种危害较小的途径衰变。我们提出,酚类除草剂的至少一些植物毒性特性可以用它们由于这种机制使PSII对光极度敏感这一事实来解释。