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电子束参数对沿晶界边缘取向模拟会聚束电子衍射花样的影响。

Effect of electron beam parameters on simulated CBED patterns from edge-on grain boundaries.

作者信息

Bokel R M, Tichelaar F D, Schapink F W

机构信息

Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands.

出版信息

J Microsc. 2000 Jan;197(Pt 1):52-9. doi: 10.1046/j.1365-2818.2000.00639.x.

Abstract

Convergent beam electron diffraction (CBED) at vertical grain boundaries (parallel to the electron beam) can be applied to determine the symmetry of bicrystals. It can also be used to investigate the structure of the boundary region itself when subnanometre probe sizes are employed. In this paper it is shown that (sub)nanometre-probe CBED patterns are largely influenced by the electron-beam geometry. In particular, simulations of coherent CBED patterns based on the multislice algorithm show that the CBED pattern of an edge-on interface depends on the defocus distance between the probe position and the specimen midplane, the probe size and the beam-convergence angle. The pattern symmetry may be lower than the theoretically predicted symmetry in case of large spherical aberration. This effect increases with smaller accelerating voltages. An increase in the beam-convergence angle also increases the possibility of a non-optimum symmetry due to spherical aberration of a coherent probe. Thus, for the determination of an interface structure using subnanometre (coherent) probes, the imaging conditions play an important role.

摘要

垂直晶界(平行于电子束)处的会聚束电子衍射(CBED)可用于确定双晶的对称性。当采用亚纳米探针尺寸时,它还可用于研究边界区域本身的结构。本文表明,(亚)纳米探针CBED图案在很大程度上受电子束几何形状的影响。特别是,基于多切片算法的相干CBED图案模拟表明,边缘取向界面的CBED图案取决于探针位置与样品中平面之间的散焦距离、探针尺寸和束会聚角。在存在大球差的情况下,图案对称性可能低于理论预测的对称性。这种效应随着加速电压的降低而增加。束会聚角的增加也会增加由于相干探针的球差而导致对称性不理想的可能性。因此,对于使用亚纳米(相干)探针确定界面结构,成像条件起着重要作用。

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