Laurens J B, de Coning J P, Swinley J M
Department of Chemical Pathology, University of Pretoria, South Africa.
J Chromatogr A. 2001 Mar 9;911(1):107-12. doi: 10.1016/s0021-9673(00)01253-x.
Highly reactive fluorinated gaseous matrices require special equipment and techniques for the gas chromatographic analysis of trace impurities in these gases. The impurities that were analysed at the low-microg/l levels included oxygen, nitrogen, carbon dioxide, carbon monoxide, sulfur hexafluoride and hydrogen. This paper describes the use of a system utilising backflush column switching to protect the columns and detectors in the analysis of trace gas impurities in tungsten hexafluoride. Two separate channels were used for the analysis of H2, O2, N2, CO, CO2 and SF6 impurities with pulsed discharge helium ionisation detection.
高反应性氟化气体基质需要特殊的设备和技术来对这些气体中的痕量杂质进行气相色谱分析。在低微克/升水平下分析的杂质包括氧气、氮气、二氧化碳、一氧化碳、六氟化硫和氢气。本文描述了一种利用反吹柱切换系统来保护色谱柱和检测器，用于分析六氟化钨中痕量气体杂质的方法。使用两个独立的通道，通过脉冲放电氦离子化检测来分析氢气、氧气、氮气、一氧化碳、二氧化碳和六氟化硫杂质。
