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两种高剂量率近距离放射治疗源在近源区域的剂量特性

Dose characterization in the near-source region for two high dose rate brachytherapy sources.

作者信息

Wang Ruqing, Li X Allen

机构信息

Department of Radiation Oncology, University of Maryland, Baltimore 21201, USA.

出版信息

Med Phys. 2002 Aug;29(8):1678-86. doi: 10.1118/1.1493780.

Abstract

High dose rate (HDR) 192Ir sources are currently used in intravascular brachytherapy (IVB) for the peripheral arterial system. This poses a demand on evaluating accurate dose parameters in the near-source region for such sources. The purpose of this work is to calculate the dose parameters for the old VariSource HDR 192Ir source and the new microSelectron HDR 192Ir source, using Monte Carlo electron and photon transport simulation. The two-dimensional (2D) dose rate distributions and the air kerma strengths for the two HDR sources were calculated by EGSnrc and EGS4 Monte Carlo codes. Based on these data, the dose parameters proposed in the AAPM TG-60 protocol were derived. The dose rate constants obtained are 13.119+/-0.028 cGy h(-1) U(-1) for the old VariSource source, and 22.751+/-0.031 cGy h(-1) U(-1) for the new microSelectron source at the reference point (r0 = 2 mm, theta = pi/2). The 2D dose rate distributions, the radial dose functions, and the anisotropy functions presented for the two sources cover radial distances ranging from 0.5 to 10 mm. In the near-source region on the transverse plane, the dose effects of the charged particle nonequilibrium and the beta-particle dose contribution were studied. It is found that at radial distances ranging from 0.5 to 2 mm, these effects increase the calculated dose rates by up to 29% for the old VariSource source, and by up to 12% for the new microSelectron source, which, in turn, change values of the radial dose function and the anisotropy function. The present dose parameters, which account for the charged particle nonequilibrium and the beta particle contribution, may be used for accurate IVB dose calculation.

摘要

高剂量率(HDR)192铱源目前用于外周动脉系统的血管内近距离放射治疗(IVB)。这对评估此类源在近源区域的准确剂量参数提出了要求。本研究的目的是使用蒙特卡罗电子和光子传输模拟来计算旧的VariSource HDR 192铱源和新的microSelectron HDR 192铱源的剂量参数。通过EGSnrc和EGS4蒙特卡罗代码计算了两种HDR源的二维(2D)剂量率分布和空气比释动能强度。基于这些数据,推导了AAPM TG - 60协议中提出的剂量参数。在参考点(r0 = 2 mm,theta = pi/2)处,旧的VariSource源获得的剂量率常数为13.119±0.028 cGy h(-1) U(-1),新的microSelectron源为22.751±0.031 cGy h(-1) U(-1)。给出的两种源的二维剂量率分布、径向剂量函数和各向异性函数涵盖了0.5至10 mm的径向距离。在横向平面的近源区域,研究了带电粒子非平衡的剂量效应和β粒子剂量贡献。结果发现,在0.5至2 mm的径向距离处,这些效应使旧的VariSource源的计算剂量率增加高达29%,使新microSelectron源的计算剂量率增加高达12%,这反过来又改变了径向剂量函数和各向异性函数的值。考虑了带电粒子非平衡和β粒子贡献的当前剂量参数可用于准确的IVB剂量计算。

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