Hua Feng, Lvov Yuri, Cui Tianhong
Institute for Micromanufacturing, Louisiana Tech University, Ruston, Louisiana, USA.
J Nanosci Nanotechnol. 2002 Jun-Aug;2(3-4):357-61. doi: 10.1166/jnn.2002.119.
A novel approach to generating clear patterns of different types of nanoparticles is presented in this paper. Nanoassembly in the vertical direction was combined with planar micropatterning. This provides industrial applications of a popular layer-by-layer method to produce multilayers of polymers, nanoparticles, and proteins organized on the nanometer scale. A thin film of organic polystyrene spheres was first coated on the pretreated silicon wafer with layer-by-layer self-assembly. Then a layer of aluminium was deposited on the thin film. A layer of positive photoresist was spun on the surface of aluminum and then illuminated with UV light. The exposed parts of the resist were removed and windows were opened above the aluminum. The subsequent etching removed exposed aluminium and left a polystyrene thin film in the open windows. Oxygen plasma was employed to remove the polystyrene thin film on the bottom. Eventually, aluminum and photoresist were removed and only the desired pattern remained. This approach was also employed for the patterning of the silica nanoparticle thin film, a widely used material in various applications. In this case, wet etching was demonstrated to etch silica particles. A scanning electron microscope was used to produce the image of the pattern.
本文提出了一种生成不同类型纳米颗粒清晰图案的新方法。垂直方向的纳米组装与平面微图案化相结合。这为一种流行的逐层方法在工业应用中生产在纳米尺度上组织的聚合物、纳米颗粒和蛋白质多层膜提供了可能。首先通过逐层自组装在预处理的硅晶片上涂覆一层有机聚苯乙烯球体薄膜。然后在该薄膜上沉积一层铝。在铝表面旋涂一层正性光刻胶，然后用紫外光照射。去除光刻胶的曝光部分，在铝上方打开窗口。随后的蚀刻去除了暴露的铝，在开口窗口中留下聚苯乙烯薄膜。采用氧等离子体去除底部的聚苯乙烯薄膜。最终，去除铝和光刻胶，仅留下所需图案。这种方法也用于二氧化硅纳米颗粒薄膜的图案化，二氧化硅是一种在各种应用中广泛使用的材料。在这种情况下，证明了湿法蚀刻可蚀刻二氧化硅颗粒。使用扫描电子显微镜生成图案图像。
