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云母及化学修饰云母上DNA的原子力显微镜观察

Atomic force microscopy of DNA on mica and chemically modified mica.

作者信息

Thundat T, Allison D P, Warmack R J, Brown G M, Jacobson K B, Schrick J J, Ferrell T L

机构信息

Health and Safety Research Division, Oak Ridge National Laboratory, TN 37831-6123.

出版信息

Scanning Microsc. 1992 Dec;6(4):911-8.

PMID:1295085
Abstract

Atomic force microscopy (AFM) was used to image circular DNA adsorbed on freshly cleaved mica and mica chemically modified with Mg(II), Co(II), La(III), and Zr(IV). Images obtained on unmodified mica show coiling of DNA due to forces involved during the drying process. The coiling or super twisting appeared to be right handed and the extent of super twisting could be controlled by the drying conditions. Images of DNA observed on chemically modified surfaces show isolated open circular DNA that is free from super twisting, presumably due to strong binding of DNA on chemically modified surfaces.

摘要

原子力显微镜(AFM)用于对吸附在新劈开云母以及用Mg(II)、Co(II)、La(III)和Zr(IV)进行化学修饰的云母上的环状DNA进行成像。在未修饰云母上获得的图像显示,由于干燥过程中涉及的力,DNA发生了卷曲。卷曲或超螺旋似乎是右手性的,超螺旋程度可由干燥条件控制。在化学修饰表面上观察到的DNA图像显示为分离的开环DNA,没有超螺旋,推测这是由于DNA在化学修饰表面上的强结合所致。

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