Gobba F, Rossi P, Roccatto L
Cattedra di Medicina del Lavoro, Università di Modena e Reggio Emilia.
G Ital Med Lav Ergon. 2003 Jul-Sep;25 Suppl(3):214-5.
Using personal dosimeters, occupational exposure to ELF-MF was measured in 150 workers employed in 28 different occupations. The main results are presented. The overall arithmetical mean in the whole sample was 0.36 microT, the overall geometric mean 0.21 microT. A high variability among workers engaged in the same occupation, and among different days in the same worker, was observed. The results suggest a relatively low exposure to ELF-MF in the large part of workers. Nevertheless, the higher levels measured in some workers, and the high variability, show the need of adequate measurements of ELF-MF exposure in workers.
使用个人剂量计,对从事28种不同职业的150名工人的极低频磁场职业暴露情况进行了测量。现将主要结果呈现如下。整个样本的算术平均值为0.36微特斯拉,几何平均值为0.21微特斯拉。观察到从事相同职业的工人之间以及同一工人在不同日期的暴露情况存在很大差异。结果表明,大部分工人的极低频磁场暴露水平相对较低。然而,部分工人测量到的较高暴露水平以及高变异性表明,有必要对工人的极低频磁场暴露情况进行充分测量。