Chance S A, Tzotzoli P M, Vitelli A, Esiri M M, Crow T J
Schizophrenia Research Group, Neuropathology, Radcliffe Infirmary, Woodstock Road, Oxford OX2 6HE, UK.
Neurosci Lett. 2004 Sep 9;367(3):384-8. doi: 10.1016/j.neulet.2004.06.041.
Developmental and psychiatric disorders, including schizophrenia, may be associated with altered cortical thickness and folding. Two studies were performed: (1) to assess cortical layering around a sulcus; cortical thickness, relative thickness of the supragranular (I-III):infragranular (IV-VI) layers, and cell density were assessed at anatomically defined points around Heschl's sulcus in tissue from 10 controls and 10 schizophrenia patients. (2) To sample sulci of contrasting prominence; sulcal depth, width, lamina thickness, and cell density from laminae II-VI were taken from various sulci within the temporal lobes from another group of 6 controls and 10 patients. Reduced cell density was found in the fundi of sulci in schizophrenia. Independent of diagnosis; increased sulcal prominence in temporal cortex accompanies reduced lamina thickness (particularly layers V and VI), deep layers show negative relationships between cell density and layer thickness, and total cortex width in Heschl's sulcus reduces by half at the bottom compared to the top. Furthermore, compared to the supragranular layers, the infragranular division is relatively thicker at the top of a gyrus, equal in the wall of the sulcus and relatively thinner at the bottom. Many effects of sulcal folding on laminar proportions in controls are similar in schizophrenia. However, cell density is less at the bottom of some sulci in the temporal lobe in schizophrenia. Sampling methods should consider that cortical folding affects cell and lamina distribution in the sampled region in a highly localised manner.
包括精神分裂症在内的发育障碍和精神疾病可能与皮质厚度和折叠异常有关。进行了两项研究:(1)评估脑沟周围的皮质分层;在10名对照者和10名精神分裂症患者的组织中,在解剖学上确定的围绕颞横沟的点处评估皮质厚度、颗粒上层(I-III层)与颗粒下层(IV-VI层)的相对厚度以及细胞密度。(2)对不同突出程度的脑沟进行采样;从另一组6名对照者和10名患者的颞叶内的各种脑沟中获取脑沟深度、宽度、板层厚度以及II-VI层的细胞密度。在精神分裂症患者的脑沟底部发现细胞密度降低。与诊断无关;颞叶皮质中脑沟突出程度增加伴随着板层厚度减小(尤其是V层和VI层),深层中细胞密度与层厚度之间呈负相关,并且颞横沟处的皮质总宽度在底部比顶部减少一半。此外,与颗粒上层相比,颗粒下层在脑回顶部相对较厚,在脑沟壁处相等,在底部相对较薄。在精神分裂症中,许多脑沟折叠对对照组中层比例的影响是相似的。然而,在精神分裂症患者中,颞叶某些脑沟底部的细胞密度较低。采样方法应考虑到皮质折叠以高度局部化的方式影响采样区域中的细胞和板层分布。