Liu Zhiguo, Li Zhuang, Zhou Hualan, Wei Gang, Song Yonghai, Wang Li
State Key Laboratory of Electroanalytical Chemistry, Changchun Institute of Applied Chemistry, Graduate School of the Chinese Academy of Sciences, Chinese Academy of Sciences, Changchun, Jilin, 130022, China.
Microsc Res Tech. 2005 Feb;66(2-3):156-62. doi: 10.1002/jemt.20158.
By controlling the interaction between the atomic force microscope tip and mica, patterns of different sizes and shape have been produced on the surface of mica. Using these operator-constructed patterns as a reliable marker, the original scanned sample location can be re-located and imaged again on the same mica surface by atomic force microscopy (AFM). This location technique can be used to find the same object again even if the sample was removed from the AFM instrument or the sample was imaged in a different mode.
通过控制原子力显微镜探针与云母之间的相互作用，在云母表面产生了不同尺寸和形状的图案。将这些由操作员构建的图案用作可靠的标记，原始扫描样品位置可以通过原子力显微镜（AFM）在同一云母表面上重新定位并再次成像。即使样品从AFM仪器中取出或样品以不同模式成像，这种定位技术也可用于再次找到相同的物体。
