The Riken Institute, 2-1 Hirosawa, Wako shi, Saitama 351-01, Japan.
Appl Environ Microbiol. 1991 May;57(5):1560-2. doi: 10.1128/aem.57.5.1560-1562.1991.
A Pseudomonas putida strain able to grow in the presence of more than 50% toluene was isolated from soil. The strain was tolerant of other toxic solvents, including aliphatic hydrocarbons, alicyclic hydrocarbons, aromatic hydrocarbons, alcohols, and ethers. The stability of the solvent tolerance of strain IH-2000 was stimulated by addition of Mg and Ca to the medium containing toluene.
从土壤中分离到一株能够在含有超过 50%甲苯的环境中生长的恶臭假单胞菌（Pseudomonas putida）菌株。该菌株能够耐受其他有毒溶剂，包括脂肪族烃、脂环族烃、芳香族烃、醇类和醚类。在含有甲苯的培养基中添加 Mg 和 Ca 可以刺激菌株 IH-2000 对溶剂耐受性的稳定性。
