Harris Daniel J, Hu Hua, Conrad Jacinta C, Lewis Jennifer A
Department of Materials Science and Engineering and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA.
Phys Rev Lett. 2007 Apr 6;98(14):148301. doi: 10.1103/PhysRevLett.98.148301. Epub 2007 Apr 5.
We investigate evaporative lithography as a route for patterning colloidal films. Films are dried beneath a mask that induces periodic variations between regions of free and hindered evaporation. Direct imaging reveals that particles segregate laterally within the film, as fluid and entrained particles migrate towards regions of higher evaporative flux. The films exhibit remarkable pattern formation that can be regulated by tuning the initial suspension composition, separation distance between the mask and underlying film, and mask geometry.
我们研究了蒸发光刻技术作为一种对胶体薄膜进行图案化的方法。薄膜在一个掩膜下干燥，该掩膜会在自由蒸发区域和受限蒸发区域之间引起周期性变化。直接成像显示，随着流体和夹带的颗粒向蒸发通量更高的区域迁移，颗粒在薄膜内横向分离。这些薄膜呈现出显著的图案形成，可通过调整初始悬浮液组成、掩膜与下层薄膜之间的分离距离以及掩膜几何形状来进行调控。
