Tarasevich Yuri Yu, Vodolazskaya Irina V, Sakharova Lyudmila V
Astrakhan State University, Moscow, Russia.
Rostov State University of Economics, Moscow, Russia.
Eur Phys J E Soft Matter. 2016 Feb;39(2):26. doi: 10.1140/epje/i2016-16026-5. Epub 2016 Feb 26.
In our model, we simulate an experiment (D.J. Harris, H. Hu, J.C. Conrad, J.A. Lewis, Patterning colloidal films via evaporative lithography, Phys. Rev. Lett. 98, 148301 (2007)). A thin colloidal sessile droplet is allowed to dry out on a horizontal hydrophilic surface. A mask just above the droplet predominantly allows evaporation from the droplet free surface directly beneath the holes in the mask. We consider one special case, when the holes in the mask are arranged so that the system has rotational symmetry of order m . We use a speculative evaporative flux to mimic the real system. Advection, diffusion, and sedimentation are taken into account. FlexPDE is utilized to solve an advection-diffusion equation using the finite element method. The simulation demonstrates that the colloidal particles accumulate below the holes as the solvent evaporates. Diffusion can reduce this accumulation.
在我们的模型中，我们模拟了一个实验（D.J. 哈里斯、H. 胡、J.C. 康拉德、J.A. 刘易斯，《通过蒸发光刻法制备胶体薄膜》，《物理评论快报》98，148301 (2007)）。使一个薄的胶体静滴在水平亲水表面上干燥。位于液滴上方的一个掩膜主要使掩膜中孔正下方的液滴自由表面发生蒸发。我们考虑一种特殊情况，即掩膜中的孔排列成使得系统具有m阶旋转对称性。我们使用一种推测性的蒸发通量来模拟真实系统。考虑了平流、扩散和沉降。利用FlexPDE通过有限元方法求解平流扩散方程。模拟表明，随着溶剂蒸发，胶体颗粒在孔下方聚集。扩散可以减少这种聚集。
