Gohier A, Djouadi M A, Dubosc M, Granier A, Minea T M, Sirghi L, Rossi F, Paredez P, Alvarez F
Institut des Matériaux Jean Rouxel, IMN, Université de Nantes, UMR CNRS 6502, 2 rue de la Houssinière, 44322 Nantes, France.
J Nanosci Nanotechnol. 2007 Sep;7(9):3350-3. doi: 10.1166/jnn.2007.883.
Single-wall (SW-) and few-walled (FW-) carbon nanotubes (CNTs) were synthesized on aluminum/ cobalt coated silicon at temperatures as low as 450 degrees C by plasma enhanced chemical vapor deposition technique (PECVD). The SWCNTs and FWCNTs grow vertically oriented and well separated from each other. The cold field emission studies of as-grown SWCNTs and FWCNTs showed low turn-on field emission threshold voltages, strongly dependent of the nanotubes morphology. Current-voltage curves of individual CNTs, measured by conductive atomic force microscopy (CAFM), showed an electrical resistance of about 90 Komega, that is attributed mainly to the resistance of the contact between the CNTs and the conductive CAFM tip (Au and Pt).
采用等离子体增强化学气相沉积技术(PECVD),在温度低至450摄氏度的铝/钴涂层硅上合成了单壁(SW-)和少壁(FW-)碳纳米管(CNT)。单壁碳纳米管和少壁碳纳米管垂直生长且彼此间距良好。对生长态的单壁碳纳米管和少壁碳纳米管进行的冷场发射研究表明,场发射开启阈值电压较低,且强烈依赖于纳米管的形态。通过导电原子力显微镜(CAFM)测量的单个碳纳米管的电流-电压曲线显示,电阻约为90千欧,这主要归因于碳纳米管与导电CAFM尖端(金和铂)之间接触的电阻。