Shirman Tanya, Freeman Dalia, Posner Yael Diskin, Feldman Isai, Facchetti Antonio, van der Boom Milko E
Department of Organic Chemistry, Weizmann Institute of Science, Rehovot 76100, Israel.
J Am Chem Soc. 2008 Jul 2;130(26):8162-3. doi: 10.1021/ja8029784. Epub 2008 Jun 5.
Polycrystalline halogen-bonded assemblies fabricated by physical vapor deposition (PVD) exhibit controllable morphologies and microstructures. Although the solid-state packing may vary going from a solution crystal growth process (used for chromophore single-crystal determination) to a vapor-phase deposition process (used for PVD film fabrication), the corresponding film microstructures are independent of the substrate surface chemistry.
通过物理气相沉积(PVD)制备的多晶卤键组装体具有可控的形态和微观结构。尽管从用于发色团单晶测定的溶液晶体生长过程到用于PVD薄膜制备的气相沉积过程,固态堆积可能会有所不同,但相应的薄膜微观结构与基底表面化学性质无关。