α-三联噻吩使pBR322 DNA发生光致敏损伤。

alpha-Terthienyl photosensitizes damage to pBR322 DNA.

作者信息

Wang T P, Kagan J, Tuveson R W, Wang G R

机构信息

Department of Chemistry, University of Illinois, Chicago 60680.

出版信息

Photochem Photobiol. 1991 Apr;53(4):463-7. doi: 10.1111/j.1751-1097.1991.tb03657.x.

DOI:10.1111/j.1751-1097.1991.tb03657.x

PMID:1857740

Abstract

alpha-Terthienyl photosensitizes single strand breaks in pBR322 DNA. Almost identical results were observed under oxygen and under argon. In the presence of oxygen, this DNA nicking was enhanced by histidine and was not affected by superoxide dismutase, catalase, or the antioxidant BHT. Although chemical damage to DNA treated with alpha-terthienyl plus near-UV was clearly demonstrated in vitro, transformation in E. coli with this damaged pBR322 DNA still took place. Likewise, Haemophilus influenzae DNA transforming activity was not significantly decreased by photosensitization with alpha-terthienyl.

摘要

α-三联噻吩可使pBR322 DNA产生单链断裂。在有氧和氩气环境下观察到了几乎相同的结果。在有氧存在的情况下，组氨酸可增强这种DNA切口的形成，而过氧化物歧化酶、过氧化氢酶或抗氧化剂丁基羟基甲苯（BHT）对此没有影响。虽然在体外已清楚证明α-三联噻吩加近紫外光对DNA有化学损伤作用，但用这种受损的pBR322 DNA转化大肠杆菌的过程仍会发生。同样，用α-三联噻吩进行光敏化处理，并不会使流感嗜血杆菌的DNA转化活性显著降低。