Tang Chuanbing, Lennon Erin M, Fredrickson Glenn H, Kramer Edward J, Hawker Craig J
Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA.
Science. 2008 Oct 17;322(5900):429-32. doi: 10.1126/science.1162950. Epub 2008 Sep 25.
The manufacture of smaller, faster, more efficient microelectronic components is a major scientific and technological challenge, driven in part by a constant need for smaller lithographically defined features and patterns. Traditional self-assembling approaches based on block copolymer lithography spontaneously yield nanometer-sized hexagonal structures, but these features are not consistent with the industry-standard rectilinear coordinate system. We present a modular and hierarchical self-assembly strategy, combining supramolecular assembly of hydrogen-bonding units with controlled phase separation of diblock copolymers, for the generation of nanoscale square patterns. These square arrays will enable simplified addressability and circuit interconnection in integrated circuit manufacturing and nanotechnology.
制造更小、更快、更高效的微电子元件是一项重大的科技挑战，部分原因是对光刻定义的更小特征和图案的持续需求。基于嵌段共聚物光刻的传统自组装方法会自发产生纳米级的六边形结构，但这些特征与行业标准的直角坐标系不一致。我们提出了一种模块化和分层的自组装策略，将氢键单元的超分子组装与二嵌段共聚物的可控相分离相结合，以生成纳米级方形图案。这些方形阵列将使集成电路制造和纳米技术中的寻址和电路互连得以简化。
