Krishnaswami Kannan, Bernacki Bruce E, Hô Nicolas, Allen Paul J, Anheier Norman C
Pacific Northwest National Laboratory, 902 Battelle Boulevard, Richland, Washington 99352, USA.
Rev Sci Instrum. 2008 Sep;79(9):095101. doi: 10.1063/1.2973640.
We have built and demonstrated a lateral shearing interferometer as a process engineering and control tool for the fabrication and characterization of direct-laser-written waveguide structures in chalcogenide glasses. Photoinduced change in refractive index of 0.154+/-0.002 was measured for as-deposited amorphous As(2)S(3) thin films at 633 nm with an estimated measurement uncertainty of 1.3% for this air-gap interferometer configuration. The simple design of this interferometer can easily be adapted to other wavelengths including mid- and long-wave infrared regions to measure changes in refractive index or material inhomogeneities in transmissive materials.
我们构建并展示了一种横向剪切干涉仪，作为一种工艺工程和控制工具，用于硫系玻璃中直接激光写入波导结构的制造和表征。对于沉积态非晶As₂S₃薄膜，在633nm处测量到光致折射率变化为0.154±0.002，对于这种气隙干涉仪配置，估计测量不确定度为1.3%。这种干涉仪的简单设计可以很容易地适应其他波长，包括中波和长波红外区域，以测量透射材料中的折射率变化或材料不均匀性。
