Noh Hyunwoo, Hung Albert M, Choi Chulmin, Lee Ju Hun, Kim Jin-Yeol, Jin Sungho, Cha Jennifer N
Department of Nanoengineering, University of California, San Diego, 9500 Gilman Drive, M/C 0448, La Jolla, California 92093-0448, USA.
ACS Nano. 2009 Aug 25;3(8):2376-82. doi: 10.1021/nn900559m.
One of the most challenging but potentially rewarding goals in nanoscience is the ability to direct the assembly of nanoscale materials into functional architectures with high yields, minimal steps, and inexpensive procedures. Despite their unique physical properties, the inherent difficulties of engineering wafer-level arrays of useful devices from nanoscale materials in a cost-effective manner have provided serious roadblocks toward technological impact. To address nanoscale features while still maintaining low fabrication costs, we demonstrate here an inexpensive printing method that enables repeated patterning of large-area arrays of nanoscale materials. DNA strands were patterned over 4 mm areas with 50 nm resolution by a soft-lithographic subtraction printing process, and DNA hybridization was used to direct the assembly of sub-20 nm materials to create highly ordered two-dimensional nanoparticle arrays. The entire printing and assembly process was accomplished in as few as three fabrication steps and required only a single lithographically templated silicon master that could be used repeatedly. The low-cost procedures developed to generate nanoscale DNA patterns can be easily extended toward roll-to-roll assembly of nanoscale materials with sub-50 nm resolution and fidelity.
纳米科学中最具挑战性但可能最有回报的目标之一，是能够以高产量、最少步骤和低成本程序，将纳米级材料组装成功能架构。尽管纳米级材料具有独特的物理特性，但以具有成本效益的方式从纳米级材料工程化有用器件的晶圆级阵列存在固有困难，这对技术影响构成了严重障碍。为了在保持低制造成本的同时处理纳米级特征，我们在此展示了一种廉价的打印方法，该方法能够对大面积的纳米级材料阵列进行重复图案化。通过软光刻减法打印工艺，在4毫米区域上以50纳米分辨率对DNA链进行图案化，并利用DNA杂交来引导亚20纳米材料的组装，以创建高度有序的二维纳米颗粒阵列。整个打印和组装过程只需三个制造步骤即可完成，并且仅需要一个可重复使用的光刻模板硅母版。为生成纳米级DNA图案而开发的低成本程序可以轻松扩展到具有亚50纳米分辨率和保真度的纳米级材料的卷对卷组装。
