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High temperature oxidation of WC-CrN Nano-multilayered film at 700 and 800 degrees C.

作者信息

Lee Dong-Bok

机构信息

School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746, South Korea.

出版信息

J Nanosci Nanotechnol. 2009 Dec;9(12):7416-21. doi: 10.1166/jnn.2009.1749.

DOI:10.1166/jnn.2009.1749
PMID:19908800
Abstract

Nano-multilayered WC-CrN films were deposited onto steel substrates by an arc ion plating method. The oxidation characteristics of the films were studied at 700 and 800 degrees C for up to 60 h in air. In each case, during oxidation, carbon and nitrogen escaped from the film into the air, while oxygen from the air diffused into the film. Substrate elements diffused outwards towards the oxide surface. The high-temperature oxidation resistance was not satisfactory, mainly due to the formation of a non-protective, volatile W-oxide scale, and the escape of carbon and nitrogen from the film. The scale formed was prone to cracking and spallation. The oxidation resulted in the destruction of the original nano-multilayers.

摘要

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