Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA.
Anal Chem. 2010 Feb 15;82(4):1270-6. doi: 10.1021/ac902224q.
Scanning ion conductance microscopy (SICM) has developed into a powerful tool for imaging a range of biophysical systems. In addition, SICM has been integrated with a range of other techniques, allowing for the simultaneous collection of complementary information including near-field optical and electrophysiological properties. However, SICM imaging remains insensitive to electrochemical properties, which play an important role in both biological and nonbiological systems. In this work, we demonstrate the fabrication and application of a nanopipet probe with an integrated ultramicroelectrode (UME) for concurrent SICM and scanning electrochemical microscopy (SECM). The fabrication process utilizes atomic layer deposition (ALD) of aluminum oxide to conformally insulate a gold-coated nanopipet and focused ion beam (FIB) milling to precisely expose a UME at the pipet tip. Fabricated probes are characterized by both scanning electron microscopy and cyclic voltammetry and exhibit a 100 nm diameter nanopipet tip and a UME with an effective radius of 294 nm. The probes exhibit positive and negative feedback responses on approach to conducting and insulating surfaces, respectively. The suitability of the probes for SECM-SICM imaging is demonstrated by both feedback-mode and substrate generation/tip collection-mode imaging on patterned surfaces. This probe geometry enables successful SECM-SICM imaging on features as small as 180 nm in size.
扫描离子电导显微镜(SICM)已发展成为一种强大的工具,可用于对多种生物物理系统进行成像。此外,SICM 已经与多种其他技术集成,允许同时收集互补信息,包括近场光学和电生理特性。然而,SICM 成像仍然对电化学性质不敏感,而电化学性质在生物和非生物系统中都起着重要作用。在这项工作中,我们展示了一种带有集成超微电极(UME)的纳米管探针的制造和应用,用于同时进行 SICM 和扫描电化学显微镜(SECM)。制造过程利用原子层沉积(ALD)氧化铝来对镀金纳米管进行共形绝缘,然后利用聚焦离子束(FIB)铣削来精确地在管尖暴露 UME。通过扫描电子显微镜和循环伏安法对制造的探针进行了表征,探针具有 100nm 直径的纳米管尖端和有效半径为 294nm 的 UME。探针在接近导电和绝缘表面时分别表现出正反馈和负反馈响应。通过在图案化表面上进行反馈模式和基底产生/尖端收集模式成像,证明了这些探针适用于 SECM-SICM 成像。这种探针几何形状使得能够成功地对尺寸小至 180nm 的特征进行 SECM-SICM 成像。