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条纹伪影在电子断层成像中的形成与消除。

Formation and reduction of streak artefacts in electron tomography.

机构信息

Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Department of Electronic Science and Technology, Xi'an Jiaotong University, Xi'an 710049, People's Republic of China.

出版信息

J Microsc. 2010 Jul 1;239(1):66-71. doi: 10.1111/j.1365-2818.2009.03357.x.

Abstract

We have analysed the formation of streak artefacts in the reconstruction based on the filtered back projection algorithm in electron tomography (ET) and accordingly applied an adaptive interpolation technique to artefact reduction. In the adaptive interpolation to recover the missing information, the edge positions in a projection curve were tracked to reduce the interpolation error. A simulation was used to demonstrate the effectiveness of the artefact reduction. Furthermore, image reconstruction of integrated circuit specimens in the ET experiments with the ultra-high voltage electron microscope show that the strong streak artefacts can be reduced effectively by our artefact reduction technique.

摘要

我们分析了基于滤波反投影算法的电子断层扫描(ET)重建中条纹伪影的形成,并相应地应用了自适应插值技术来减少伪影。在自适应插值以恢复丢失的信息时,跟踪投影曲线中的边缘位置以减少插值误差。通过模拟证明了减少伪影的有效性。此外,利用超高压电子显微镜进行的集成电路试样 ET 实验的图像重建表明,我们的伪影减少技术可以有效地减少强条纹伪影。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/90c7/3470927/7874bf9f53bc/jmi0239-0066-f1.jpg

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