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基于二氧化钒金属-绝缘体相变的紧凑型硅光子波导调制器。

Compact silicon photonic waveguide modulator based on the vanadium dioxide metal-insulator phase transition.

作者信息

Briggs Ryan M, Pryce Imogen M, Atwater Harry A

机构信息

1Thomas J. Watson Laboratories of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA.

出版信息

Opt Express. 2010 May 24;18(11):11192-201. doi: 10.1364/OE.18.011192.

Abstract

We have integrated lithographically patterned VO2 thin films grown by pulsed laser deposition with silicon-on-insulator photonic waveguides to demonstrate a compact in-line absorption modulator for use in photonic circuits. Using single-mode waveguides at lambda=1550 nm, we show optical modulation of the guided transverse-electric mode of more than 6.5 dB with 2 dB insertion loss over a 2-microm active device length. Loss is determined for devices fabricated on waveguide ring resonators by measuring the resonator spectral response, and a sharp decrease in resonator quality factor is observed above 70 degrees C, consistent with switching of VO2 to its metallic phase. A computational study of device geometry is also presented, and we show that it is possible to more than double the modulation depth with modified device structures.

摘要

我们已将通过脉冲激光沉积生长的光刻图案化VO₂薄膜与绝缘体上硅光子波导集成在一起,以展示一种用于光子电路的紧凑型在线吸收调制器。在λ = 1550 nm处使用单模波导,我们展示了在2微米有源器件长度上,导行横向电模的光调制超过6.5 dB,插入损耗为2 dB。通过测量谐振器的光谱响应来确定在波导环形谐振器上制造的器件的损耗,并且在70摄氏度以上观察到谐振器品质因数急剧下降,这与VO₂转变为其金属相一致。还给出了器件几何结构的计算研究,并且我们表明通过修改器件结构可以使调制深度增加一倍以上。

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