Ohtani M, Hanabusa M
Appl Opt. 1992 Sep 20;31(27):5830-2. doi: 10.1364/AO.31.005830.
We fabricate ridge-type optical waveguides by laser direct writing. Lines of Si(3)N(4), typically 10 microm wide and 0.6 microm high, are drawn on Si substrates covered with a 0.5-microm-thick SiO(2) buffer layer. An Ar(+) laser is used to heat the substrate locally and to induce a thermal reaction for SiH(4) and NH(3). The writing speed is up to 1.8 mm/min. The transmission loss for the TE(0) is 0.6 dB/cm.
我们通过激光直写技术制造脊型光波导。在覆盖有0.5微米厚二氧化硅缓冲层的硅衬底上绘制典型宽度为10微米、高度为0.6微米的氮化硅线。使用氩离子激光对衬底进行局部加热，并引发硅烷和氨气的热反应。写入速度高达1.8毫米/分钟。TE(0)模式的传输损耗为0.6分贝/厘米。
