Optoelectronics Research Centre, University of Southampton, Highfield, Southampton, Hampshire SO17 1BJ, UK.
Opt Lett. 2010 Sep 1;35(17):2849-51. doi: 10.1364/OL.35.002849.
The propagation loss of a direct UV-written silica-on-silicon waveguide is measured using an elegant nondestructive method. The technique uses integrated Bragg grating structures, which are observed from opposing launch directions to obtain information about the optical power at different positions along the length of the waveguide. Critically, the technique is ratiometric and independent of coupling loss and grating variability. This high-precision measurement is suitable for low-loss planar waveguides. From this data, the propagation loss of the UV-written waveguides was observed to be 0.235+/-0.006 dB/cm.
使用一种优雅的无损方法测量了直接紫外写入的硅基波导的传播损耗。该技术使用集成布拉格光栅结构，从相反的发射方向进行观察，以获取沿波导长度不同位置的光功率信息。重要的是，该技术是相对的，与耦合损耗和光栅变化无关。这种高精度测量适用于低损耗平面波导。根据这些数据，观察到紫外写入波导的传播损耗为 0.235+/-0.006 dB/cm。
