NSF Nano-scale Science and Engineering Center, 3112 Etcheverry Hall, University of California at Berkeley, Berkeley, California 94720, USA.
Nature. 2011 Jun 2;474(7349):64-7. doi: 10.1038/nature10067. Epub 2011 May 8.
Integrated optical modulators with high modulation speed, small footprint and large optical bandwidth are poised to be the enabling devices for on-chip optical interconnects. Semiconductor modulators have therefore been heavily researched over the past few years. However, the device footprint of silicon-based modulators is of the order of millimetres, owing to its weak electro-optical properties. Germanium and compound semiconductors, on the other hand, face the major challenge of integration with existing silicon electronics and photonics platforms. Integrating silicon modulators with high-quality-factor optical resonators increases the modulation strength, but these devices suffer from intrinsic narrow bandwidth and require sophisticated optical design; they also have stringent fabrication requirements and limited temperature tolerances. Finding a complementary metal-oxide-semiconductor (CMOS)-compatible material with adequate modulation speed and strength has therefore become a task of not only scientific interest, but also industrial importance. Here we experimentally demonstrate a broadband, high-speed, waveguide-integrated electroabsorption modulator based on monolayer graphene. By electrically tuning the Fermi level of the graphene sheet, we demonstrate modulation of the guided light at frequencies over 1 GHz, together with a broad operation spectrum that ranges from 1.35 to 1.6 µm under ambient conditions. The high modulation efficiency of graphene results in an active device area of merely 25 µm(2), which is among the smallest to date. This graphene-based optical modulation mechanism, with combined advantages of compact footprint, low operation voltage and ultrafast modulation speed across a broad range of wavelengths, can enable novel architectures for on-chip optical communications.
具有高速调制、小尺寸和大光带宽的集成光学调制器有望成为片上光互连的关键器件。因此,在过去几年中,半导体调制器受到了广泛的研究。然而,由于硅的电光性能较弱,其器件尺寸约为毫米量级。另一方面,锗和化合物半导体在与现有的硅电子学和光子学平台集成方面面临着重大挑战。将硅调制器与高品质因数的光学谐振器集成可以提高调制强度,但这些器件固有带宽较窄,需要复杂的光学设计;它们还具有严格的制造要求和有限的温度容限。因此,找到一种具有适当调制速度和强度的互补金属氧化物半导体(CMOS)兼容材料不仅是科学研究的任务,也是工业界的重要任务。在这里,我们通过实验演示了一种基于单层石墨烯的宽带、高速、波导集成电吸收调制器。通过电调谐石墨烯片的费米能级,我们在 1GHz 以上的频率下演示了导光的调制,同时在环境条件下,其工作光谱范围从 1.35μm 到 1.6μm。石墨烯的高调制效率导致有源器件面积仅为 25μm2,这是目前为止最小的之一。这种基于石墨烯的光调制机制具有紧凑的尺寸、低工作电压和超高速调制速度的综合优势,可以为片上光通信提供新的架构。