Department of Chemistry, Tsinghua University, Beijing 100084, PR China.
Langmuir. 2011 Jun 7;27(11):7185-91. doi: 10.1021/la200719g. Epub 2011 May 9.
It is well-known that silica can be etched in alkaline media or in a unique hydrofluoric acid (HF) solution, which is widely used to prepare various kinds of hollow nanostructures (including silica hollow structures) via silica-templating methods. In our experiments, we found that stöber silica spheres could be etched in generic acidic media in a well-controlled way under hydrothermal conditions, forming well-defined hollow/rattle-type silica spheres. Furthermore, some salts such as NaCl and Na(2)SO(4) were found to be favorable for the formation of hollow/rattle-type silica spheres.
众所周知，二氧化硅可以在碱性介质中或独特的氢氟酸（HF）溶液中被刻蚀，这一特性被广泛应用于通过硅模板法制备各种中空纳米结构（包括二氧化硅中空结构）。在我们的实验中，我们发现斯托贝（Stöber）二氧化硅球在水热条件下可以在通用的酸性介质中被可控地刻蚀，形成具有良好定义的中空/晃荡型二氧化硅球。此外，还发现一些盐，如 NaCl 和 Na2SO4，有利于中空/晃荡型二氧化硅球的形成。
