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通过原子层沉积法涂覆的硅条形和槽形波导中传播损耗的降低。

Reduced propagation loss in silicon strip and slot waveguides coated by atomic layer deposition.

作者信息

Alasaarela T, Korn D, Alloatti L, Säynätjoki A, Tervonen A, Palmer R, Leuthold J, Freude W, Honkanen S

机构信息

Department of Micro and Nanosciences, Aalto University School of Electrical Engineering, Aalto, Finland.

出版信息

Opt Express. 2011 Jun 6;19(12):11529-38. doi: 10.1364/OE.19.011529.

Abstract

When silicon strip and slot waveguides are coated with a 50 nm amorphous titanium dioxide (TiO2) film, measured losses at a wavelength of 1.55 μm can be as low as (2 ± 1)dB/cm and (7 ± 2)dB/cm, respectively. We use atomic layer deposition (ALD), estimate the effect of ALD growth on the surface roughness, and discuss the effect on the scattering losses. Because the gap between the rails of a slot waveguide narrows by the TiO2 deposition, the effective slot width can be back-end controlled. This is useful for precise adjustment if the slot is to be filled with, e. g., a nonlinear organic material or with a sensitizer for sensors applications.

摘要

当硅条形波导和槽形波导涂覆有50纳米的非晶二氧化钛(TiO₂)薄膜时,在1.55微米波长下测得的损耗分别可低至(2±1)分贝/厘米和(7±2)分贝/厘米。我们采用原子层沉积(ALD)技术,估计ALD生长对表面粗糙度的影响,并讨论其对散射损耗的影响。由于槽形波导的导轨之间的间隙因TiO₂沉积而变窄,因此有效槽宽可以在后端进行控制。如果要在槽中填充例如非线性有机材料或用于传感器应用的敏化剂,这对于精确调整很有用。

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