Alasaarela T, Korn D, Alloatti L, Säynätjoki A, Tervonen A, Palmer R, Leuthold J, Freude W, Honkanen S
Department of Micro and Nanosciences, Aalto University School of Electrical Engineering, Aalto, Finland.
Opt Express. 2011 Jun 6;19(12):11529-38. doi: 10.1364/OE.19.011529.
When silicon strip and slot waveguides are coated with a 50 nm amorphous titanium dioxide (TiO2) film, measured losses at a wavelength of 1.55 μm can be as low as (2 ± 1)dB/cm and (7 ± 2)dB/cm, respectively. We use atomic layer deposition (ALD), estimate the effect of ALD growth on the surface roughness, and discuss the effect on the scattering losses. Because the gap between the rails of a slot waveguide narrows by the TiO2 deposition, the effective slot width can be back-end controlled. This is useful for precise adjustment if the slot is to be filled with, e. g., a nonlinear organic material or with a sensitizer for sensors applications.
当硅条形波导和槽形波导涂覆有50纳米的非晶二氧化钛(TiO₂)薄膜时,在1.55微米波长下测得的损耗分别可低至(2±1)分贝/厘米和(7±2)分贝/厘米。我们采用原子层沉积(ALD)技术,估计ALD生长对表面粗糙度的影响,并讨论其对散射损耗的影响。由于槽形波导的导轨之间的间隙因TiO₂沉积而变窄,因此有效槽宽可以在后端进行控制。如果要在槽中填充例如非线性有机材料或用于传感器应用的敏化剂,这对于精确调整很有用。