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利用泊松光斑光刻技术制备大规模有序硅微管阵列。

Large-scale ordered silicon microtube arrays fabricated by Poisson spot lithography.

机构信息

Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, People's Republic of China.

出版信息

Nanotechnology. 2011 Sep 30;22(39):395301. doi: 10.1088/0957-4484/22/39/395301. Epub 2011 Sep 2.

Abstract

A novel approach based on the Poisson spot effect in a conventional optical lithography system is presented for fabricating large-scale ordered ring patterns at low cost, in which the pattern geometries are tuned by controlling the exposure dose and deliberate design of the mask patterns. Following this by cryogenic deep etching, the ring patterns are transferred into Si substrates, resulting in various vertical tubular Si array structures. Microscopic analysis indicates that the as-fabricated Si microtubes have smooth interior and exterior surfaces that are uniform in size, shape and wall-thickness, which exhibit potential applications as electronic, biological and medical devices.

摘要

提出了一种基于传统光学光刻系统泊松光斑效应的新方法,用于低成本制造大规模有序环形图案,通过控制曝光剂量和掩模图案的精心设计来调整图案几何形状。随后通过深低温刻蚀,将环形图案转移到 Si 衬底上,形成各种垂直管状 Si 阵列结构。微观分析表明,所制备的 Si 微管具有光滑的内外表面,尺寸、形状和壁厚均匀,在电子、生物和医疗设备方面具有潜在的应用。

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