School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA.
ACS Nano. 2009 Dec 22;3(12):4033-42. doi: 10.1021/nn901174e.
Metal-assisted chemical etching (MaCE) of silicon in conjunction with shaped catalysts was used to fabricate 3D nanostructures such as sloping channels, cycloids, and spirals along with traditional vertical channels. The investigation used silver nanorods, nanodonuts along with electron beam lithography (EBL)-patterned gold nanodiscs, nanolines, squares, grids, and star-shaped catalysts to show how catalyst shape and line width directly influence etching direction. Feature sizes ranging from micrometers down to 25 nm were achieved with aspect ratios of at least 10:1 and wall roughness of 10 nm or less. This research demonstrates the potential of MaCE as a new, maskless nanofabrication technology.
采用金属辅助化学刻蚀（MaCE）结合形状可控的催化剂，制备了具有 3D 结构的纳米结构，如倾斜通道、摆线和螺旋线，同时还保留了传统的垂直通道。该研究使用了银纳米棒、纳米环以及电子束光刻（EBL）图案化的金纳米盘、纳米线、正方形、网格和星形催化剂，以展示催化剂形状和线宽如何直接影响刻蚀方向。通过 MaCE 实现了从微米到 25nm 的特征尺寸，其纵横比至少为 10:1，壁粗糙度小于 10nm。该研究证明了 MaCE 作为一种新的无掩模纳米制造技术的潜力。
