Holmes Matthew R, Shang Tao, Hawkins Aaron R, Rudenko Mikhail, Measor Philip, Schmidt Holger
Brigham Young University, Electrical and Computer Engineering Department, 459 Clyde Building, Provo, Utah 84602.
J Micro Nanolithogr MEMS MOEMS. 2010;9(2):23004. doi: 10.1117/1.3378152.
We demonstrate the fabrication of micropore and nanopore features in hollow antiresonant reflecting optical waveguides to create an electrical and optical analysis platform that can size select and detect a single nanoparticle. Micropores (4 μm diameter) are reactive-ion etched through the top SiO(2) and SiN layers of the waveguides, leaving a thin SiN membrane above the hollow core. Nanopores are formed in the SiN membranes using a focused ion-beam etch process that provides control over the pore size. Openings as small as 20 nm in diameter are created. Optical loss measurements indicate that micropores did not significantly alter the loss along the waveguide.
我们展示了在中空抗反射反射光波导中制造微孔和纳米孔特征，以创建一个能够对单个纳米颗粒进行尺寸选择和检测的电学和光学分析平台。微孔（直径4μm）通过反应离子蚀刻穿过波导的顶部SiO₂和SiN层，在中空芯上方留下一层薄的SiN膜。使用聚焦离子束蚀刻工艺在SiN膜中形成纳米孔，该工艺可控制孔径。制造出了直径小至20nm的开口。光学损耗测量表明，微孔不会显著改变沿波导的损耗。
