Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States.
Nano Lett. 2011 Nov 9;11(11):5079-84. doi: 10.1021/nl203445h. Epub 2011 Oct 19.
Block copolymer self-assembly generates patterns with periodicity in the ∼10-100 nm range and is increasingly recognized as a route to lithographic patterning beyond the resolution of photolithography. Block copolymers naturally produce periodic patterns with a morphology and length-scale determined by the molecular architecture, and considerable research has been carried out to extend the range of patterns that can be produced from a given block copolymer, but the ability to control the period of the pattern over a wide range and to achieve complex structures with mixed morphologies from a given block copolymer is limited. Here we show how patterns consisting of coexisting sub-10-nm spheres and cylinders and sphere patterns with a range of periods can be created using a combination of serial solvent anneal processes and electron-beam irradiation of selected areas of a film of poly(styrene-block-dimethylsiloxane). These techniques extend the capabilities of block copolymer lithography, enabling complex aperiodic nanoscale patterns to be formed from a single block copolymer thin film.
嵌段共聚物自组装可以生成具有周期性的图案，其周期性在 10-100nm 范围内，并且越来越被认为是超越光刻分辨率的光刻图案化的一种途径。嵌段共聚物自然会产生具有形态和长度尺度的周期性图案，这些形态和长度尺度由分子结构决定，因此已经进行了大量的研究来扩展可以从给定的嵌段共聚物中产生的图案的范围，但是控制图案的周期在很宽的范围内的能力，以及从给定的嵌段共聚物实现具有混合形态的复杂结构的能力是有限的。在这里，我们展示了如何使用一系列溶剂退火过程和电子束辐照选定区域的聚（苯乙烯-嵌段-二甲基硅氧烷）薄膜的组合来创建由共存的亚 10nm 球体和圆柱体组成的图案和具有一系列周期的球体图案。这些技术扩展了嵌段共聚物光刻的能力，使复杂的非周期性纳米尺度图案可以由单个嵌段共聚物薄膜形成。
