Department of Metallurgic and Materials Engineering, Federal University of Rio de Janeiro, Rio de Janeiro, Rio de Janeiro, Brazil.
J Endod. 2011 Nov;37(11):1550-2. doi: 10.1016/j.joen.2011.08.014. Epub 2011 Sep 15.
Dentin surface treatment with different substances might cause alterations in chemical and structural compositions of the human dentin. The aim of this study was to investigate the wettability of endodontic sealers in contact with dentin treated with 5.25% sodium hypochlorite (NaOCl) and 2% chlorhexidine (CHX) in the presence or absence of smear layer.
Thirty-six dentin slices were used. They were irrigated with NaOCl and washed with distilled water (DW) to simulate irrigation during chemomechanical preparation. After this procedure, the samples were divided into 6 groups: group 1, DW (control); group 2, NaOCl + DW; group 3, CHX + DW; group 4, ethylenediaminetetraacetic acid (EDTA) + DW; group 5, EDTA + DW + NaOCl + DW; group 6, EDTA + DW + CHX + DW. The Ramé-Hart goniometer was used to measure the contact angle between the dentin surfaces and the AH Plus and Real Seal SE sealers. Data were statistically analyzed.
With regard to the contact angle between AH Plus and treated surfaces, the values of contact angle were lower when CHX was used, regardless of the presence or absence of smear layer. When Real Seal SE was evaluated, in the absence of smear layer, CHX presented lower values of contact angle. In the presence of smear layer, the use of NaOCl and CHX did not favor the spread of the sealer.
The present study has revealed that smear layer removal and final flush with CHX favor the wettability of AH Plus and Real Seal SE sealers.
用不同物质处理牙本质表面可能会改变人牙本质的化学和结构组成。本研究的目的是研究在有或没有玷污层的情况下，用 5.25%次氯酸钠（NaOCl）和 2%洗必泰（CHX）处理牙本质后，根管封闭剂与牙本质的润湿性。
使用 36 个牙本质切片。用 NaOCl 冲洗并用蒸馏水（DW）冲洗以模拟化学机械预备过程中的冲洗。在这个过程之后，将样本分为 6 组：第 1 组，DW（对照组）；第 2 组，NaOCl + DW；第 3 组，CHX + DW；第 4 组，乙二胺四乙酸（EDTA）+ DW；第 5 组，EDTA + DW + NaOCl + DW；第 6 组，EDTA + DW + CHX + DW。使用拉梅-哈特测角仪测量牙本质表面与 AH Plus 和 Real Seal SE 密封剂之间的接触角。对数据进行了统计学分析。
关于 AH Plus 和处理表面之间的接触角，使用 CHX 时，无论是否存在玷污层，接触角的值都较低。当评估 Real Seal SE 时，在没有玷污层的情况下，CHX 表现出较低的接触角值。在存在玷污层的情况下，使用 NaOCl 和 CHX 不利于密封剂的扩散。
本研究表明，去除玷污层并用 CHX 进行最终冲洗有利于 AH Plus 和 Real Seal SE 密封剂的润湿性。
