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在六方氮化硼衬底上对石墨烯和石墨炔的准粒子能带隙进行工程设计。

Quasiparticle band gap engineering of graphene and graphone on hexagonal boron nitride substrate.

机构信息

Computational Center for Nanotechnology Innovations and Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180, United States.

出版信息

Nano Lett. 2011 Dec 14;11(12):5274-8. doi: 10.1021/nl202725w. Epub 2011 Oct 27.

Abstract

Graphene holds great promise for post-silicon electronics; however, it faces two main challenges: opening up a band gap and finding a suitable substrate material. In principle, graphene on hexagonal boron nitride (hBN) substrate provides a potential system to overcome these challenges. Recent theoretical and experimental studies have provided conflicting results: while theoretical studies suggested a possibility of a finite band gap of graphene on hBN, recent experimental studies find no band gap. Using the first-principles density functional method and the many-body perturbation theory, we have studied graphene on hBN substrate. A Bernal stacked graphene on hBN has a band gap on the order of 0.1 eV, which disappears when graphene is misaligned with respect to hBN. The latter is the likely scenario in realistic devices. In contrast, if graphene supported on hBN is hydrogenated, the resulting system (graphone) exhibits band gaps larger than 2.5 eV. While the band gap opening in graphene/hBN is due to symmetry breaking and is vulnerable to slight perturbation such as misalignment, the graphone band gap is due to chemical functionalization and is robust in the presence of misalignment. The band gap of graphone reduces by about 1 eV when it is supported on hBN due to the polarization effects at the graphone/hBN interface. The band offsets at graphone/hBN interface indicate that hBN can be used not only as a substrate but also as a dielectric in the field effect devices employing graphone as a channel material. Our study could open up new way of band gap engineering in graphene based nanostructures.

摘要

石墨烯在硅基电子学之后的应用前景广阔;然而,它面临两个主要挑战:打开带隙和寻找合适的衬底材料。原则上,六方氮化硼(hBN)衬底上的石墨烯提供了克服这些挑战的潜在系统。最近的理论和实验研究提供了相互矛盾的结果:虽然理论研究表明 hBN 上的石墨烯可能存在有限的带隙,但最近的实验研究并未发现带隙。我们使用第一性原理密度泛函方法和多体微扰理论研究了 hBN 衬底上的石墨烯。在 hBN 上,堆叠的石墨烯具有约 0.1eV 的带隙,当石墨烯相对于 hBN 不对准时,带隙消失。在后一种情况下,这更符合实际器件的情况。相比之下,如果 hBN 支撑的石墨烯被氢化,则得到的系统(graphone)表现出大于 2.5eV 的带隙。虽然石墨烯/hBN 中的带隙打开是由于对称性破缺,并且容易受到轻微的扰动,例如不对准,但 graphone 的带隙是由于化学官能化,并且在存在不对准时具有鲁棒性。由于在 graphone/hBN 界面处的极化效应,graphone 的带隙在其被 hBN 支撑时减小约 1eV。graphone/hBN 界面处的能带偏移表明,hBN 不仅可以用作衬底,而且可以用作采用 graphone 作为沟道材料的场效应器件中的介电材料。我们的研究为基于石墨烯的纳米结构中的带隙工程开辟了新途径。

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