Sattari-Esfahlan Seyed Mehdi, Mirzaei Saeed, Josline Mukkath Joseph, Moon Ji-Yun, Hyun Sang-Hwa, Jang Houk, Lee Jae-Hyun
Institute for Microelectronics, 1040, Vienna, TU, Austria.
CEITEC BUT, Brno University of Technology, Purkynova 123, 61200, Brno, Czech Republic.
Nano Converg. 2025 May 2;12(1):22. doi: 10.1186/s40580-025-00486-1.
Amorphous boron nitride (a-BN) exhibits remarkable electrical, optical, and chemical properties, alongside robust mechanical stability, making it a compelling material for advanced applications in nanoelectronics and photonics. This review comprehensively examines the unique characteristics of a-BN, emphasizing its electrical and optical attributes, state-of-the-art synthesis techniques, and device applications. Key advancements in low-temperature growth methods for a-BN are highlighted, offering insights into their potential for integration into scalable, CMOS-compatible platforms. Additionally, the review discusses the emerging role of a-BN as a dielectric material in electronic and photonic devices, serving as substrates, encapsulation layers, and gate insulators. Finally, perspectives on future challenges, including defect control, interface engineering, and scalability, are presented, providing a roadmap for realizing the full potential of a-BN in next-generation device technologies.
非晶态氮化硼(a-BN)具有卓越的电学、光学和化学性质,同时具备强大的机械稳定性,使其成为纳米电子学和光子学高级应用中极具吸引力的材料。本综述全面研究了a-BN的独特特性,重点关注其电学和光学属性、先进的合成技术以及器件应用。突出了a-BN低温生长方法的关键进展,深入探讨了其集成到可扩展的、与CMOS兼容平台的潜力。此外,该综述还讨论了a-BN作为电子和光子器件中的介电材料所发挥的新兴作用,如用作衬底、封装层和栅极绝缘体。最后,阐述了未来面临的挑战,包括缺陷控制、界面工程和可扩展性等方面的观点,为在下一代器件技术中充分发挥a-BN的潜力提供了路线图。