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反应性化学掺杂 Bi2Se3 拓扑绝缘体。

Reactive chemical doping of the Bi2Se3 topological insulator.

机构信息

Max-Planck-Institut für Festkörperforschung, 70569 Stuttgart, Germany.

出版信息

Phys Rev Lett. 2011 Oct 21;107(17):177602. doi: 10.1103/PhysRevLett.107.177602. Epub 2011 Oct 19.

Abstract

Using angular resolved photoemission spectroscopy we studied the evolution of the surface electronic structure of the topological insulator Bi(2)Se(3) as a function of water vapor exposure. We find that a surface reaction with water induces a band bending, which shifts the Dirac point deep into the occupied states and creates quantum well states with a strong Rashba-type splitting. The surface is thus not chemically inert, but the topological state remains protected. The band bending is traced back to Se abstraction, leaving positively charged vacancies at the surface. Because of the presence of water vapor, a similar effect takes place when Bi(2)Se(3) crystals are left in vacuum or cleaved in air, which likely explains the aging effect observed in the Bi(2)Se(3) band structure.

摘要

我们使用角分辨光电子能谱研究了拓扑绝缘体 Bi(2)Se(3)的表面电子结构随水蒸气暴露的演化。我们发现,与水的表面反应导致能带弯曲,将狄拉克点深移到占据态,并产生具有强烈拉什巴型分裂的量子阱态。因此,表面不是化学惰性的,但拓扑状态仍然受到保护。能带弯曲可以追溯到硒的抽离,在表面留下带正电的空位。由于水蒸气的存在,当 Bi(2)Se(3)晶体留在真空中或在空气中劈开时,也会发生类似的效应,这可能解释了在 Bi(2)Se(3)能带结构中观察到的老化效应。

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