Gruev Viktor
Department of Computer Science and Engineering, Washington University in St. Louis, One Brookings Drive, St. Louis, Missouri 63130, USA.
Opt Express. 2011 Nov 21;19(24):24361-9. doi: 10.1364/OE.19.024361.
In this paper we present a procedure for fabricating an array of micropolarization filter array via an optimized interference lithography and microfabrication procedure. The filter array is composed of two linear polarization filters offset by 45 degrees with pixel pitch of 18 microns. The individual polarization filters are composed of aluminum nanowires with 140 nm pitch, 140 nm height and 70 nm width. The maximum extinction ratio of the pixelated filters is measured to be 95 at 700 nm wavelength.
在本文中，我们展示了一种通过优化的干涉光刻和微加工工艺制造微偏振滤光器阵列的方法。该滤光器阵列由两个相互错开45度、像素间距为18微米的线性偏振滤光器组成。各个偏振滤光器由间距为140纳米、高度为140纳米、宽度为70纳米的铝纳米线构成。在700纳米波长下，像素化滤光器的最大消光比测得为95。
