K.A.N.C., Suwon, Gyeonggi 443-270, Republic of Korea.
Nano Lett. 2012 Jan 11;12(1):298-302. doi: 10.1021/nl203564s. Epub 2011 Dec 13.
Herein we report that silicon nanowires (SiNWs) fabricated via metal-catalyzed electroless etching yielded a photoelectrochemical hydrogen generation performance superior to that of a planar Si, which is attributed to a lower kinetic overpotential due to a higher surface roughness, favorable shift in the flat-band potential, and light-trapping effects of the SiNW surface. The SiNW photocathode yielded a photovoltage of 0.42 V, one of the highest values ever reported for hydrogen generation on p-type Si/electrolyte interfaces.
在此,我们报告了通过金属催化无电蚀刻制备的硅纳米线(SiNWs)具有优于平面 Si 的光电化学制氢性能,这归因于更高的表面粗糙度导致的更低的动力学过电位、平带电位的有利偏移以及 SiNW 表面的光捕获效应。SiNW 光阴极产生的光电压为 0.42 V,这是在 p 型 Si/电解质界面上制氢的最高值之一。