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工作速率高达30 Gb/s的低压高性能硅光子器件及光子集成电路。

Low-voltage high-performance silicon photonic devices and photonic integrated circuits operating up to 30 Gb/s.

作者信息

Kim Gyungock, Park Jeong Woo, Kim In Gyoo, Kim Sanghoon, Kim Sanggi, Lee Jong Moo, Park Gun Sik, Joo Jiho, Jang Ki-Seok, Oh Jin Hyuk, Kim Sun Ae, Kim Jong Hoon, Lee Jun Young, Park Jong Moon, Kim Do-Won, Jeong Deog-Kyoon, Hwang Moon-Sang, Kim Jeong-Kyoum, Park Kyu-Sang, Chi Han-Kyu, Kim Hyun-Chang, Kim Dong-Wook, Cho Mu Hee

机构信息

Electronics & Telecommunications Research Institute, Yuseong-gu, Daejeon, Korea.

出版信息

Opt Express. 2011 Dec 19;19(27):26936-47. doi: 10.1364/OE.19.026936.

DOI:10.1364/OE.19.026936
PMID:22274277
Abstract

We present high performance silicon photonic circuits (PICs) defined for off-chip or on-chip photonic interconnects, where PN depletion Mach-Zehnder modulators and evanescent-coupled waveguide Ge-on-Si photodetectors were monolithically integrated on an SOI wafer with CMOS-compatible process. The fabricated silicon PIC(off-chip) for off-chip optical interconnects showed operation up to 30 Gb/s. Under differential drive of low-voltage 1.2 V(pp), the integrated 1 mm-phase-shifter modulator in the PIC(off-chip) demonstrated an extinction ratio (ER) of 10.5dB for 12.5 Gb/s, an ER of 9.1dB for 20 Gb/s, and an ER of 7.2 dB for 30 Gb/s operation, without adoption of travelling-wave electrodes. The device showed the modulation efficiency of V(π)L(π) ~1.59 Vcm, and the phase-shifter loss of 3.2 dB/mm for maximum optical transmission. The Ge photodetector, which allows simpler integration process based on reduced pressure chemical vapor deposition exhibited operation over 30 Gb/s with a low dark current of 700 nA at -1V. The fabricated silicon PIC(intra-chip) for on-chip (intra-chip) photonic interconnects, where the monolithically integrated modulator and Ge photodetector were connected by a silicon waveguide on the same chip, showed on-chip data transmissions up to 20 Gb/s, indicating potential application in future silicon on-chip optical network. We also report the performance of the hybrid silicon electronic-photonic IC (EPIC), where a PIC(intra-chip) chip and 0.13μm CMOS interface IC chips were hybrid-integrated.

摘要

我们展示了为片外或片上光子互连定义的高性能硅光子电路(PIC),其中PN耗尽马赫曾德尔调制器和倏逝耦合波导硅基锗光电探测器通过CMOS兼容工艺单片集成在一个SOI晶圆上。所制造的用于片外光互连的硅PIC(片外)显示其工作速率高达30 Gb/s。在1.2 V(峰峰值)的低电压差分驱动下,PIC(片外)中集成的1 mm移相器调制器在12.5 Gb/s时消光比(ER)为10.5 dB,在20 Gb/s时ER为9.1 dB,在30 Gb/s工作时ER为7.2 dB,且未采用行波电极。该器件的调制效率V(π)L(π)约为1.59 V·cm,最大光传输时移相器损耗为3.2 dB/mm。基于减压化学气相沉积的锗光电探测器集成工艺更简单,在-1V时暗电流低至700 nA,工作速率超过30 Gb/s。所制造的用于片上(片内)光子互连的硅PIC(片内),其中单片集成的调制器和锗光电探测器通过同一芯片上的硅波导连接,片上数据传输速率高达20 Gb/s,表明其在未来硅基片上光网络中的潜在应用。我们还报告了混合硅电子 - 光子集成电路(EPIC)的性能,其中一个PIC(片内)芯片和0.13μm CMOS接口IC芯片进行了混合集成。

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