School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts, USA.
Nat Protoc. 2012 Jan 26;7(2):311-27. doi: 10.1038/nprot.2012.003.
We provide a protocol for transforming the structure of an array of high-aspect-ratio (HAR) micro/nanostructures into various new geometries. Polymeric HAR arrays are replicated from a Bosch-etched silicon master pattern by soft lithography. By using various conditions, the original pattern is coated with metal, which acts as an electrode for the electrodeposition of conductive polymers, transforming the original structure into a wide range of user-defined new designs. These include scaled replicas with sub-100-nm-level control of feature sizes and complex 3D shapes such as tapered or bent columnar structures bearing hierarchical features. Gradients of patterns and shapes on a single substrate can also be produced. This benchtop fabrication protocol allows the production of customized libraries of arrays of closed-cell or isolated HAR micro/nanostructures at a very low cost within 1 week, when starting from a silicon master that otherwise would be very expensive and slow to produce using conventional fabrication techniques.
我们提供了一种将高纵横比（HAR）微/纳米结构阵列的结构转换为各种新几何形状的方案。通过软光刻技术，聚合物 HAR 阵列从 Bosch 刻蚀的硅主图案中复制而来。通过使用各种条件，原始图案被金属覆盖，金属充当用于电沉积导电聚合物的电极，将原始结构转换为广泛的用户定义的新设计。这些设计包括具有亚 100nm 级别的特征尺寸控制的比例复制以及复杂的 3D 形状，例如具有分级特征的锥形或弯曲的柱状结构。还可以在单个基底上产生图案和形状的梯度。当从硅主模板开始时，该台式制造方案允许在一周内以非常低的成本生产定制的闭孔或隔离的 HAR 微/纳米结构阵列库，而使用传统制造技术制作硅主模板则非常昂贵且耗时。
