Frontier Research Laboratory, Samsung Advanced Institute of Technology, Yongin-si, Gyeonggi-do, Republic of Korea.
Nanotechnology. 2012 Sep 7;23(35):355302. doi: 10.1088/0957-4484/23/35/355302. Epub 2012 Aug 15.
The patterning of colloidal quantum dots with nanometer resolution is essential for their application in photonics and plasmonics. Several patterning approaches, such as the use of polymer composites, molecular lock-and-key methods, inkjet printing and microcontact printing of quantum dots have been recently developed. Herein, we present a simple method of patterning colloidal quantum dots for photonic nanostructures such as straight lines, rings and dot patterns either on transparent or metallic substrates. Sub-10 nm width of the patterned line could be achieved with a well-defined sidewall profile. Using this method, we demonstrate a surface plasmon launcher from a quantum dot cluster in the visible spectrum.
胶体量子点的纳米级图案化对于它们在光子学和等离子体学中的应用至关重要。最近已经开发出几种图案化方法,例如使用聚合物复合材料、分子锁和键方法、量子点的喷墨打印和微接触印刷。在此,我们提出了一种简单的胶体量子点图案化方法,可用于在透明或金属衬底上形成光子纳米结构,例如直线、圆环和点图案。可以实现具有明确定义的侧壁轮廓的亚 10nm 宽度的图案化线。使用这种方法,我们在可见光谱中展示了来自量子点簇的表面等离激元发射器。